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Fujifilm Triples Oita Factory Capacity for Advanced Post-CMP Cleaners

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Sig3.32Sen+4.92Env0.00Soc0.00Gov+0.37

Fujifilm completed a new production facility at its Oita Factory to triple capacity for post-CMP cleaners used after CMP processes to remove particles, trace metals and organic residues. The move supports rising demand for advanced semiconductor materials tied to miniaturization and 3D stacking, with sales of post-CMP cleaners expected to more than double by FY2030 versus FY2024.

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