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Fujifilm Completes New Oita Facility for Post-CMP Cleaners

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Sig3.25Sen+5.60Env0.00Soc0.00Gov0.00

Fujifilm completed a new production building for post-CMP cleaners at the Oita Factory of Fujifilm Electronic Materials (FFEM), with operations starting in August. The facility expands capacity for cleaners used after CMP to remove particles, trace metals and organic residues, supporting growing demand for advanced semiconductors, including those for AI. Fujifilm expects to accelerate global semiconductor materials sales, especially in North America, Europe, and Asia.

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